Lithographic methods (CVD, PVD, e-beam, ion beam, magnetron, evaporation, spin coating, mask fabrication, developing resists); microelectromechanical systems and nanoelectromechanical systems; limits of conventional mechanical processing, electroforming, growth mechanisms (organic, inorganic, thermal); powders. Credit will not be awarded for MEGR 7104 where credit has been awarded for ECGR 7104 or MEGR 8104 .

Credit Hours: (3)
Prerequisite(s): NANO 8101 or permission of instructor.
Cross-listed Course(s): ECGR 7104 and MEGR 8104 .

Schedule of Classes

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